Resolution Enhancement Techniques in Optical Lithography (SPIE Tutorial Texts in Optical Engineering Vol. TT47) |  | Author: Alfred Kwok-Kit Wong
Publisher: SPIE Publications
Category: Book
Buy New: $54.00
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Languages: English (Unknown), English (Original Language), English (Published)
Media: Paperback
Pages: 234
Number Of Items: 1
Shipping Weight (lbs): 1.1
Dimensions (in): 10 x 7.1 x 0.6
ISBN: 0819439959
EAN: 9780819439956
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Product Description
This tutorial summarizes optical lithography enhancement research and development over the past 20 years. Discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers.Contents - Foreword
- Preface
- List of symbols
- Introduction
- Optical imaging and resolution
- Modified illumination
- Optical proximity correction
- Alternating phase-shifting mask
- Attenuated phase-shift mask
- Selecting appropriate RETs
- Second-generation RETs
- Concluding remarks
- k1 conversion charts
- Bibliography
- Index
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