Abstracts Submission

To download the latest Call for Abstracts, please click here

Online Abstract Submission Closed on 29 Feb 08.
Review results sent to authors on 14 March 08

Submission Instructions

Prospective authors are invited to submit abstract(s) of not more than 250 words, double spacing on a single A4 sheet, saved in MSWORD or PDF. Download the LM Abstract Template

Abstracts should contain enough detail to clearly convey the approach and the results of the research. Identify the keywords appropriate for your abstract.

Only original material should be submitted. Commercial papers, papers with no new research/development content, and papers where supporting data or a technical description cannot be given for proprietary reasons will not be accepted for presentation in this symposium.

All abstracts MUST be submitted electronically via the online submission system. Only electronic submission will be accepted. Should you require assistance on the submission, please contact the symposium secretariat.

Submissions imply the intent of at least one author to register, attend the symposium, present the paper (either orally or in poster format), and submit a full-length manuscript for publication in the Symposium Proceedings.

Proceedings will be published by SPIE. Selected authors will be invited to send papers for special issue of Optics and Lasers in Engineering.

Topics include, but not limited to:

  1. Dimensional measurements using optical techniques
  2. Lasers and Laser Optics
  3. Precision optical metrology
  4. Active vision/metrology
  5. Micro-meso-nano-metrology
  6. Resolution Enhancement Techniques
  7. Interferometric and diffractive methods
  8. Optical Measurement Standards and Calibration
  9. Photomechanics
  10. Photoelasticity & Birefringence techniques
  11. Holographic and speckle techniques
  12. Moiré and structured illumination
  13. Image processing
  14. Nondestructive testing evaluation and fault detection
  15. Shape measurement/reverse engineering
  16. Thin Film Metrology
  17. EUV, X-Ray Metrology
  18. AFM, SEM Systems
  19. Ultrafast laser metrology
  20. Spectroscopy and Spectral Metrology
  21. Special Session-High Resolution Metrology
  22. Special Session-Laser Spectroscopy of Semiconductors
  23. Special Session-3D Displacement Metrology
  24. Special Session-Metrology of X-ray and EUV Optics